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CVD chemical vapor deposition of diamond buy in Zhengzhou
Buy CVD chemical vapor deposition of diamond
CVD chemical vapor deposition of diamond

CVD chemical vapor deposition of diamond

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80 CNY
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China, Zhengzhou
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Technical characteristics
  • BrandYW
  • Country of manufactureChina
  • Shaperound
  • PlaceZhengzhou
  • SizeCustomized
  • MaterialCVD
Description

CVD (Chemical Vapor Deposition, CVD), and refers to a reaction mixture containing the desired vapor film elements constituting the gaseous or liquid reactants other reactant gas is introduced into the reaction chamber of the chemical reaction occurs in the film formed on the surface of the substrate process. VLSI many films were prepared using the CVD method. After the CVD process, the surface treatment adhesion film of about 30%, high-strength steel to prevent bending, stretching scratches produced during molding. The method of chemical vapor deposition using the CVD diamond is grown out of a pure polycrystalline diamond material, which can be attached to the surface of the substrate, which is commonly known as the "diamond film" can also be an independent diamond thick slices (commonly known as diamond thick ). CVD diamond because does not contain any metal or non-metal binding agent, and most of its performance single crystal diamond similar or identical. Therefore, developed countries are widely used in high power density electronic devices heat sink (heat sink member), high-precision cutting tools, high efficiency grinding wheel dressing tools, wear devices. PCD cutting tools and compared, CVD diamond tools with the biggest advantage is the high finish, long life, impact toughness drawback is slightly worse. Wald company with world-class CVD diamond thick film materials and advanced welding, grinding technology, manufacturing a variety of CVD diamond compact cutter. For the processing of copper, aluminum and other nonferrous metals or alloys, can achieve close to a single crystal of high-quality finish and tool than any granularity PCD tool long life. For the processing of glass and steel, life is far more than any grade of PCD tools.
CVD refers to a gas phase reaction at high temperatures, such as hot metal halides, organic metals, hydrocarbons decomposition or hydrogen reduction of mixed gas to make it at a high temperature chemical reaction to precipitate metals, oxides the process of carbide and other inorganic materials. This technology was originally developed as a means of coating, and now only used in heat-resistant coating material and applied to refining high purity metal powder synthesis, semiconductor films.
CVD CVD diamond deposition temperature characteristics are low, easy to control the film composition, film thickness and deposition time proportional uniformity, repeatability, excellent step coverage. Technically characterized in that: (1) high melting point can be synthesized at low temperature; (2) precipitation of substances in the form of a variety of single-crystal, polycrystalline, whiskers, powders, films and the like; (3) may be carried out not only on the substrate coating, and can be in powder surface coating

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CVD chemical vapor deposition of diamond
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